Spiro-OMeTAD, high performance HTL material

High-purity (>99%) and available online for priority dispatch

Spiro-OMeTAD (Spiro-MeOTAD) is one of the most studied and suitable hole transport layer materials (HTL) due to its facile implementation and high performance in organic-inorganic electronic devices. The spiro-linked molecule provides high glass transition temperature (Tg), morphological stability and easy processability while maintaining good electronic properties. Spiro-MeOTAD has been widely used in solid-state dye-sensitised solar cells (ssDSSC), organic light-emitting diodes (OLED), perovskite solar cells (PSCs) and polymer based organic solar cells (OSCs).

Spiro-OMeTAD | CAS 207739-72-8

Spiro-ometad Full name: 2,2',7,7'-Tetrakis[N,N-di(4-methoxyphenyl)amino]-9,9'-spirobifluorene

Spiro-ometad Chinese name: 2,2',7,7'-tetra[N,N-di(4-methoxyphenyl)amino]-9,9'-spirobifluorene

Sublimed synonym: Spiro-OMeTAD Spiro-MeOTAD

Molecular formula: C81H68N4O8

Molecular weight: 1225.43

Mw: 1225.43 g/mol

CAS: 207739-72-8

English synonyms: 2,2',7,7'-Tetrakis[N,N-di(4-methoxyphenyl)amino]-9,9'-spirobifluorene;2,2',7,7'-Tetrakis(N,N-p -dimethoxyphenylamino)-9,9'-spirobifluorene;Spiro-OMeTAD;9,9'-Spirobi[9H-fluorene]-2,2',7,7'-tetraMine,N2,N2,N2',N2',N7 ,N7,N7',N7'-octakis(4-Methoxyphenyl)-;spiro-omet;2,2',7,7'-tetrakis(N,N-di-p-MethoxyphenylaMino)-9,9'-spirobifluorene ;SPIRO-MEOTAD;N2,N2,N2',N2',N7,N7,N7',N7'-Octakis(4-Methoxyphenyl)-

Related categories: Electronic Chemicals; Perovskite Materials; Organic Chemistry; Hole Transport Materials; Amines; Aromatics; Fluorescent Labels & Indicators; OLEDs

Melting point 234-238°C

Density 1.35±0.1g/cm3(Predicted)

Storage Conditions Refrigerator

Acidity coefficient (pKa)-1.22±0.20(Predicted)InChIKeyXDXWNHPWWKGTKO-UHFFFAOYSA-N

Uses and Synthetic Methods 2,2',7,7'-Tetrakis[N,N-bis(4-methoxyphenyl)amino]-9,9'-spirobifluorene is an intermediate in organic synthesis and medicine , can be used in the laboratory.

Uses 2,2',7,7'-Tetrakis[N,N-bis(4-methoxyphenyl)amino]-9,9'-spirobifluorene is a spirobifluorene derivative suitable for charge Transfer materials, photovoltaic cells, are also used in electroluminescent materials.

Spiro-OMeTAD | cas207739-72-8 structure

DESCRIPTION

General description

We are committed to bringing you Greener Alternative Products,which adhere to one or more of The 12 Principles of Greener Chemistry. This product is an enabling product used as a Hole Transport Material for high-performance solar cells and thus has been enhanced for energy efficiency. Click here for more information.

Application

High-mobility material used for white OLEDs to increase hole injection and transport. It is the best solid-state hole transporting material, to date, used to replace the liquid electrolyte for DSSC solar cells, due to an excellent pore-filling property in nanoporous TiO2 film with pore size of around 30-50 nm; attributed to its small molecular size.

Packaging

1, 5 g in glass bottle

PROPERTIES

Spiro-OMeTAD (Spiro-MeOTAD) from Borun New Material was used in the high-impact paper (IF 29.37), Interfacing Pristine C60 onto TiO2 for Viable Flexibility in Perovskite Solar Cells by a Low-Temperature All-Solution Process, Y. Zhou et al., Adv. Energy Mater., 1800399 (2018); DOI: 10.1002/aenm.201800399.

References

Interface engineering of highly efficient perovskite solar cells, Huanping Zhou et al., Science, V 34, p.546 (2014).

Sequential deposition as a route to high-performance perovskite-sensitized solar cells, Julian Burschka et al., Nature, V499 p.316 (2013).

Nanostructured TiO2 /CH3NH3PbI3 heterojunction solar cells employing spiro-OMeTAD/Co-complex as hole-transporting material, Jun Hong Noh et al., J. Mater. Chem. A, 1, 11842-11847, DOI: 10.1039/C3TA12681A (2013).

Key details from references

[1]: High efficiency perovskite solar cells with >19% efficiency. Doping regime specified via reference [2].

[2]: Spin coated spiro-MeOTAD in chlorobenzene doped with the below compounds (doping ratio's specified in reference [3]:

4-tert-butylpyridine

lithium bis(trifluoromethylsul-phonyl)imide (LiTFSI)

tris(2-(1H-pyrazol-1-yl)-4-tert-butylpyridine)cobalt(III) bis(tri-fluoromethylsulphonyl)imide

[3]: Doped with the below concentrations

50 mM spiro-OMeTAD in chlorobenzene

Co(III)-complex (FK209) first dissolved into an acetonitrile stock solution prepared with concentrations in the range 4 to 33 mM before being added to the Spiro/chlorobenzene solution

FK209 stock solution mixed with Spiro/chlorobenzene solution to give overall 7.7 mol% FK209 to Spiro-OMeTAD

Also doped with a stock solution of Li-bis(trifluoromethanesulfonyl)imide (Li-TFSI) at 170 mg and TBP at 46.6% by volume in acetonitrile

Spin-coated at 3000 rpm for 30s

Techniques for obtaining uniform films with Spiro-OMeTAD include
Spiro-OMeTAD CAS 207739-72-8, Organic Photovoltaic Materials CAS 207739-72-8, Spiro-OMeTAD Organic Photovoltaic Materials

1. Solution preparation: Ensure thorough mixing and homogeneity of the Spiro-OMeTAD solution to achieve a uniform distribution of its components. Avoid the presence of undissolved particles or aggregates.

2. Solvent selection: Choose a solvent or solvent mixture that promotes the dissolution and uniform dispersion of Spiro-OMeTAD. Proper solvent selection is crucial for achieving uniform film formation.

3. Concentration control: Adjust the concentration of Spiro-OMeTAD in the solution to optimize film formation. A balanced concentration ensures uniformity while avoiding excessive aggregation or precipitation.

4. Substrate surface treatment: Pre-treat the substrate surface to improve wettability and promote the adhesion of the Spiro-OMeTAD solution. Proper cleaning and surface modification techniques can enhance the uniformity of the resulting film.

5. Spin-coating parameters: Optimize the spin-coating parameters, including rotation speed, acceleration, and duration, to achieve a uniform and consistent coating across the substrate. Different parameters may be required for different film thicknesses or substrate types.

6. Ambient conditions: Control the temperature, humidity, and cleanliness of the coating environment. Stable ambient conditions help prevent solvent evaporation variations and contamination, leading to more uniform film formation.

7. Multiple coating and annealing steps: Consider applying multiple layers of Spiro-OMeTAD, with intermediate annealing steps between each layer. This technique helps to improve the overall film uniformity and minimize defects.

8. Real-time monitoring: Employ in-situ monitoring techniques, such as ellipsometry or spectroscopy, to monitor the film formation process in real-time. This allows for adjustments and optimization during the coating process.

By implementing these techniques, it is possible to achieve more uniform films with Spiro-OMeTAD, leading to improved device performance and reproducibility.

Supply Spiro-OMeTAD Organic Photovoltaic Materials CAS 207739-72-8 C81H68N4O8

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